JPS6142852B2 - - Google Patents
Info
- Publication number
- JPS6142852B2 JPS6142852B2 JP52061783A JP6178377A JPS6142852B2 JP S6142852 B2 JPS6142852 B2 JP S6142852B2 JP 52061783 A JP52061783 A JP 52061783A JP 6178377 A JP6178377 A JP 6178377A JP S6142852 B2 JPS6142852 B2 JP S6142852B2
- Authority
- JP
- Japan
- Prior art keywords
- lift
- resist
- negative resist
- electron beam
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6178377A JPS53147465A (en) | 1977-05-27 | 1977-05-27 | Forming method of patterns for lift-off |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6178377A JPS53147465A (en) | 1977-05-27 | 1977-05-27 | Forming method of patterns for lift-off |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53147465A JPS53147465A (en) | 1978-12-22 |
| JPS6142852B2 true JPS6142852B2 (en]) | 1986-09-24 |
Family
ID=13181022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6178377A Granted JPS53147465A (en) | 1977-05-27 | 1977-05-27 | Forming method of patterns for lift-off |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53147465A (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62199384U (en]) * | 1986-06-06 | 1987-12-18 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5432975A (en) * | 1977-08-19 | 1979-03-10 | Agency Of Ind Science & Technol | Formation method of pattern on resist film and resist film |
| JPS56164531A (en) * | 1980-05-21 | 1981-12-17 | Hitachi Ltd | Manufacture of semiconductor |
| JPS5750465A (en) * | 1980-09-11 | 1982-03-24 | Fujitsu Ltd | Semiconductor memory device |
-
1977
- 1977-05-27 JP JP6178377A patent/JPS53147465A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62199384U (en]) * | 1986-06-06 | 1987-12-18 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53147465A (en) | 1978-12-22 |
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